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	1.	Extreme ultraviolet lithography / [edited by] Banqiu Wu, Ajay Kumar. by Kumar, Ajay, 1962- Wu, Banqiu Material type: Text; Format: print Publication details: New York : McGraw-Hill, 2009 Availability: Items available for loan: UMK Kampus Bachok (1)Call number: TK7872.M3 E987 2009 OS. UMK Kampus Kota (1)Call number: TK7872.M3 E987 2009 OS. Place hold
	2.	Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. by Eynon, Benjamin G Wu, Banqiu Series: McGraw-Hill electronic engineering Material type: Text; Format: print Publication details: New York : McGraw-Hill, c2005 Availability: Items available for loan: UMK Kampus Bachok (1)Call number: TK7872.M3 E99 2005 . Place hold
	3.	Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. by Eynon, Benjamin G Wu, Banqiu Series: McGraw-Hill electronic engineering series Material type: Text; Format: print Publication details: New York : McGraw-Hill, c2005 Availability: Items available for loan: UMK Kampus Bachok (1)Call number: TK7872.M3 E99 2005. Not available: UMK Kampus Kota: Damaged (1). Place hold

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