Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.

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Material type: Text

TextSeries: McGraw-Hill electronic engineeringPublication details: New York : McGraw-Hill, c2005.Description: xi, 571 p. : ill. ; 24 cmISBN:

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Holdings
Item type	Current library	Home library	Collection	Shelving location	Call number	Status	Date due	Barcode
Open Shelf	UMK Kampus Bachok	UMK Kampus Bachok	FTKW	Kampus Bachok Open Shelf Level 1	TK7872.M3 E99 2005 (Browse shelf(Opens below))	Available		10020786

Includes bibliographical references and index.

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