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Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.

By: Contributor(s): Material type: TextTextSeries: McGraw-Hill electronic engineering seriesPublication details: New York : McGraw-Hill, c2005.Description: xi, 571 p. : ill. ; 24 cmISBN:
  • 0071445633 (alk. paper)
  • 9780071445634
Subject(s):
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Holdings
Item type Current library Home library Collection Shelving location Call number Copy number Status Date due Barcode
Open Shelf Open Shelf UMK Kampus Bachok UMK Kampus Bachok FTKW Kampus Bachok Open Shelf Level 1 TK7872.M3 E99 2005 (Browse shelf(Opens below)) Available 10312752
References References UMK Kampus Kota UMK Kampus Kota DEFAULT Kampus Kota Reference TK7872.M3 E99 2005 (Browse shelf(Opens below)) 1 Not for loan Damaged 10020758

Includes bibliographical references and index

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