Photomask fabrication technology /
Eynon, Benjamin G.
Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. - New York : McGraw-Hill, c2005. - xi, 571 p. : ill. ; 24 cm. - McGraw-Hill electronic engineering . - McGraw-Hill electronic engineering series. .
Includes bibliographical references and index
0071445633 (alk. paper) 9780071445634
Integrated circuits--Masks.
Masks (Electronics)
Microlithography.
Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. - New York : McGraw-Hill, c2005. - xi, 571 p. : ill. ; 24 cm. - McGraw-Hill electronic engineering . - McGraw-Hill electronic engineering series. .
Includes bibliographical references and index
0071445633 (alk. paper) 9780071445634
Integrated circuits--Masks.
Masks (Electronics)
Microlithography.