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Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. by Series: McGraw-Hill electronic engineering
Material type: Text Text; Format: print
Publication details: New York : McGraw-Hill, c2005
Availability: Items available for loan: UMK Kampus Bachok (1)Call number: TK7872.M3 E99 2005 .

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2.
Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu. by Series: McGraw-Hill electronic engineering series
Material type: Text Text; Format: print
Publication details: New York : McGraw-Hill, c2005
Availability: Items available for loan: UMK Kampus Bachok (1)Call number: TK7872.M3 E99 2005. Not available: UMK Kampus Kota: Damaged (1).

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