Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
Material type:
TextSeries: McGraw-Hill electronic engineering seriesPublication details: New York : McGraw-Hill, c2005.Description: xi, 571 p. : ill. ; 24 cmISBN: - 0071445633 (alk. paper)
- 9780071445634
| Item type | Current library | Home library | Collection | Shelving location | Call number | Copy number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|---|
Open Shelf
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UMK Kampus Bachok | UMK Kampus Bachok | FTKW | Kampus Bachok Open Shelf Level 1 | TK7872.M3 E99 2005 (Browse shelf(Opens below)) | Available | 10312752 | |||
References
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UMK Kampus Kota | UMK Kampus Kota | DEFAULT | Kampus Kota Reference | TK7872.M3 E99 2005 (Browse shelf(Opens below)) | 1 | Not for loan Damaged | 10020758 |
Browsing UMK Kampus Bachok shelves, Shelving location: Kampus Bachok Open Shelf Level 1, Collection: FTKW Close shelf browser (Hides shelf browser)
| TK7872.C8 P33 2006 Charge pump circuit design / | TK7872.F73 R87 2008 Sound synthesis and sampling / | TK7872.M3 E987 2009 OS Extreme ultraviolet lithography / | TK7872.M3 E99 2005 Photomask fabrication technology / | TK7872.M3 E99 2005 Photomask fabrication technology / | TK7872.P38 B475 2007 OS Phase-locked loops: design, simulation, and applications / | TK7872.T6 R88 2008 Pengukuran dan transduser / |
Includes bibliographical references and index
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