Photomask fabrication technology / Benjamin G. Eynon, Jr., Banqiu Wu.
Material type:
TextSeries: McGraw-Hill electronic engineeringPublication details: New York : McGraw-Hill, c2005.Description: xi, 571 p. : ill. ; 24 cmISBN: - 0071445633
- 9780071445634
| Item type | Current library | Home library | Collection | Shelving location | Call number | Status | Date due | Barcode | |
|---|---|---|---|---|---|---|---|---|---|
Open Shelf
|
UMK Kampus Bachok | UMK Kampus Bachok | FTKW | Kampus Bachok Open Shelf Level 1 | TK7872.M3 E99 2005 (Browse shelf(Opens below)) | Available | 10020786 |
Browsing UMK Kampus Bachok shelves, Shelving location: Kampus Bachok Open Shelf Level 1, Collection: FTKW Close shelf browser (Hides shelf browser)
| TK7872.F73 R87 2008 Sound synthesis and sampling / | TK7872.M3 E987 2009 OS Extreme ultraviolet lithography / | TK7872.M3 E99 2005 Photomask fabrication technology / | TK7872.M3 E99 2005 Photomask fabrication technology / | TK7872.P38 B475 2007 OS Phase-locked loops: design, simulation, and applications / | TK7872.T6 R88 2008 Pengukuran dan transduser / | TK7874.65 R33 2003 Digital integrated circuits:a design perspective |
Includes bibliographical references and index.
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