TY  - BOOK
AU  - Eynon,Benjamin G.
AU  - Wu,Banqiu
TI  - Photomask fabrication technology
T2  - McGraw-Hill electronic engineering
SN  - 0071445633 (alk. paper)
PY  - 2005///
CY  - New York
PB  - McGraw-Hill
KW  - Integrated circuits
KW  - Masks
KW  - Masks (Electronics)
KW  - Microlithography
N1  - Includes bibliographical references and index
ER  -