Eynon, Benjamin G. <br/><br/>
Photomask fabrication technology / 
Benjamin G. Eynon, Jr., Banqiu Wu. 
 - New York :  McGraw-Hill,  c2005. 
 - xi, 571 p. :  ill. ;  24 cm. 
 - McGraw-Hill electronic engineering .
 - McGraw-Hill electronic engineering series. .
<br/><br/>Includes bibliographical references and index 
<br/><br/><label>ISBN: </label>0071445633 (alk. paper) 9780071445634 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Integrated circuits--Masks.<br/>Masks (Electronics)<br/>Microlithography.